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Atomic layer deposition of on W for metal–insulator–metal capacitor application
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10.1063/1.1569985
/content/aip/journal/apl/82/17/10.1063/1.1569985
http://aip.metastore.ingenta.com/content/aip/journal/apl/82/17/10.1063/1.1569985
/content/aip/journal/apl/82/17/10.1063/1.1569985
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/content/aip/journal/apl/82/17/10.1063/1.1569985
2003-04-21
2014-07-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomic layer deposition of ZrO2 on W for metal–insulator–metal capacitor application
http://aip.metastore.ingenta.com/content/aip/journal/apl/82/17/10.1063/1.1569985
10.1063/1.1569985
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