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Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers
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10.1063/1.1583857
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    Affiliations:
    1 Laboratory for High Intensity Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, People’s Republic of China
    2 State Key Laboratory for Optical and Electric Materials and Technology, Zhongshan University, Guangzhou, 510275, People’s Republic of China
    3 Laboratory for High Intensity Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, People’s Republic of China
    4 State Key Laboratory for Optical and Electric Materials and Technology, Zhongshan University, Guangzhou, 510275, People’s Republic of China
    Appl. Phys. Lett. 82, 4382 (2003); http://dx.doi.org/10.1063/1.1583857
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/content/aip/journal/apl/82/24/10.1063/1.1583857
2003-06-10
2014-12-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Microscopic mechanisms of ablation and micromachining of dielectrics by using femtosecond lasers
http://aip.metastore.ingenta.com/content/aip/journal/apl/82/24/10.1063/1.1583857
10.1063/1.1583857
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