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Parameters that control pulsed electron beam ablation of materials and film deposition processes
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10.1063/1.1541945
/content/aip/journal/apl/82/6/10.1063/1.1541945
http://aip.metastore.ingenta.com/content/aip/journal/apl/82/6/10.1063/1.1541945
/content/aip/journal/apl/82/6/10.1063/1.1541945
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/content/aip/journal/apl/82/6/10.1063/1.1541945
2003-02-04
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Parameters that control pulsed electron beam ablation of materials and film deposition processes
http://aip.metastore.ingenta.com/content/aip/journal/apl/82/6/10.1063/1.1541945
10.1063/1.1541945
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