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Dielectric properties of high-k films grown by metalorganic chemical vapor deposition on silicon
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10.1063/1.1580633
/content/aip/journal/apl/83/1/10.1063/1.1580633
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/1/10.1063/1.1580633
/content/aip/journal/apl/83/1/10.1063/1.1580633
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/content/aip/journal/apl/83/1/10.1063/1.1580633
2003-06-30
2014-09-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Dielectric properties of Pr2O3 high-k films grown by metalorganic chemical vapor deposition on silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/1/10.1063/1.1580633
10.1063/1.1580633
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