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In situ control of the focused-electron-beam-induced deposition process
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10.1063/1.1626261
/content/aip/journal/apl/83/19/10.1063/1.1626261
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/19/10.1063/1.1626261
/content/aip/journal/apl/83/19/10.1063/1.1626261
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/content/aip/journal/apl/83/19/10.1063/1.1626261
2003-11-03
2014-08-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ control of the focused-electron-beam-induced deposition process
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/19/10.1063/1.1626261
10.1063/1.1626261
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