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Reduction of boron thermal diffusion in silicon by high energy fluorine implantation
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10.1063/1.1622434
/content/aip/journal/apl/83/20/10.1063/1.1622434
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/20/10.1063/1.1622434
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/content/aip/journal/apl/83/20/10.1063/1.1622434
2003-11-12
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduction of boron thermal diffusion in silicon by high energy fluorine implantation
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/20/10.1063/1.1622434
10.1063/1.1622434
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