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Band gap tailoring of -doped nanoparticles
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10.1063/1.1627962
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    Affiliations:
    1 Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716
    2 Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716
    3 Department of Civil and Environmental Engineering, University of Delaware, Newark, Delaware 19716
    4 Department of Materials Science and Engineering and Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716
    5 Department of Civil and Environmental Engineering, University of Delaware, Newark, Delaware 19716
    6 Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716
    7 Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716
    8 Department of Chemical Engineering, University of Delaware, Newark, Delaware 19716
    Appl. Phys. Lett. 83, 4143 (2003); http://dx.doi.org/10.1063/1.1627962
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/content/aip/journal/apl/83/20/10.1063/1.1627962
2003-11-12
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Band gap tailoring of Nd3+-doped TiO2 nanoparticles
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/20/10.1063/1.1627962
10.1063/1.1627962
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