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Charge detrapping in high-κ gate dielectric stacks
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10.1063/1.1633332
/content/aip/journal/apl/83/25/10.1063/1.1633332
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/25/10.1063/1.1633332
/content/aip/journal/apl/83/25/10.1063/1.1633332
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/content/aip/journal/apl/83/25/10.1063/1.1633332
2003-12-17
2014-08-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Charge detrapping in HfO2 high-κ gate dielectric stacks
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/25/10.1063/1.1633332
10.1063/1.1633332
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