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Boron pile-up at the interface between plasma enhanced chemical vapor deposited film and -doped Si
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10.1063/1.1594287
/content/aip/journal/apl/83/3/10.1063/1.1594287
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/3/10.1063/1.1594287
/content/aip/journal/apl/83/3/10.1063/1.1594287
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/content/aip/journal/apl/83/3/10.1063/1.1594287
2003-07-16
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Boron pile-up at the interface between plasma enhanced chemical vapor deposited TiSi2 film and BF2-doped Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/3/10.1063/1.1594287
10.1063/1.1594287
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