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Study on interfacial dislocations of Si substrate/epitaxial layer by self-interstitial decoration technique
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10.1063/1.1596385
/content/aip/journal/apl/83/5/10.1063/1.1596385
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/5/10.1063/1.1596385
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/content/aip/journal/apl/83/5/10.1063/1.1596385
2003-07-30
2014-08-28
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Study on interfacial dislocations of Si substrate/epitaxial layer by self-interstitial decoration technique
http://aip.metastore.ingenta.com/content/aip/journal/apl/83/5/10.1063/1.1596385
10.1063/1.1596385
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