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Crystallization kinetics and microstructure-dependent leakage current behavior of ultrathin dielectrics: In situ annealing studies
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10.1063/1.1667621
/content/aip/journal/apl/84/12/10.1063/1.1667621
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/12/10.1063/1.1667621
/content/aip/journal/apl/84/12/10.1063/1.1667621
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/content/aip/journal/apl/84/12/10.1063/1.1667621
2004-03-16
2014-09-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Crystallization kinetics and microstructure-dependent leakage current behavior of ultrathin HfO2 dielectrics: In situ annealing studies
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/12/10.1063/1.1667621
10.1063/1.1667621
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