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Effects of interlayer and annealing on chemical states of gate insulators studied by photoemission spectroscopy
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10.1063/1.1689393
/content/aip/journal/apl/84/13/10.1063/1.1689393
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/13/10.1063/1.1689393
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/content/aip/journal/apl/84/13/10.1063/1.1689393
2004-03-23
2014-09-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effects of interlayer and annealing on chemical states of HfO2 gate insulators studied by photoemission spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/13/10.1063/1.1689393
10.1063/1.1689393
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