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Complex admittance analysis for high-κ dielectric stacks
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10.1063/1.1639942
/content/aip/journal/apl/84/2/10.1063/1.1639942
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/2/10.1063/1.1639942
/content/aip/journal/apl/84/2/10.1063/1.1639942
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/content/aip/journal/apl/84/2/10.1063/1.1639942
2004-01-07
2014-10-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Complex admittance analysis for La2Hf2O7/SiO2 high-κ dielectric stacks
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/2/10.1063/1.1639942
10.1063/1.1639942
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