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Self-assembled monolayer resist for atomic layer deposition of and high-κ gate dielectrics
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10.1063/1.1751211
/content/aip/journal/apl/84/20/10.1063/1.1751211
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/20/10.1063/1.1751211
/content/aip/journal/apl/84/20/10.1063/1.1751211
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/content/aip/journal/apl/84/20/10.1063/1.1751211
2004-05-05
2014-10-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/20/10.1063/1.1751211
10.1063/1.1751211
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