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Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection
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10.1063/1.1762702
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    Affiliations:
    1 Department of Electrical and Electronic Engineering, Meijo University, Tempaku, Nagoya 468-8502, Japan
    2 Department of Materials Science and Engineering, Meijo University, Tempaku, Nagoya 468-8502, Japan
    3 Department of Electrical and Electronic Engineering and Information Engineering, Nagoya University, Chikusa, Nagoya 464-8603, Japan
    Appl. Phys. Lett. 84, 4708 (2004); http://dx.doi.org/10.1063/1.1762702
/content/aip/journal/apl/84/23/10.1063/1.1762702
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/content/aip/journal/apl/84/23/10.1063/1.1762702
2004-05-19
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of vertically aligned carbon nanowalls using capacitively coupled plasma-enhanced chemical vapor deposition assisted by hydrogen radical injection
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/23/10.1063/1.1762702
10.1063/1.1762702
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