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Fabrication of linewidth and pitch features by nanoimprint lithography
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10.1063/1.1766071
/content/aip/journal/apl/84/26/10.1063/1.1766071
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/26/10.1063/1.1766071
/content/aip/journal/apl/84/26/10.1063/1.1766071
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/content/aip/journal/apl/84/26/10.1063/1.1766071
2004-06-17
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/84/26/10.1063/1.1766071
10.1063/1.1766071
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