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Tribonanolithography of silicon in aqueous solution based on atomic force microscopy
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10.1063/1.1773620
/content/aip/journal/apl/85/10/10.1063/1.1773620
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/10/10.1063/1.1773620
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Mechanism for protruding silicon oxide formation by the TNL method. (a) Enlarged AFM topography image of a single line. (b) AFM topography image of an area consisting of a series of oxidized protuberances with a pitch of . All the images were recorded at a scan rate of using a conventional cantilever for the measurements.

Image of FIG. 2.
FIG. 2.

(a) AFM topography image of nanostructures prepared by the TNL method with a normal force of in aqueous KOH solution (left) or air (right). (b) Cross-sectional topography trace of the line marked in (a).

Image of FIG. 3.
FIG. 3.

(a) Change in inclination of the protruding structures generated upon increasing the speed in the direction, , from . (b) AFM topography image of the nanostructure prepared by the TNL method in KOH solution. The speed in the direction was changed from after modifying half the area. (c) Cross-sectional topography trace of the line marked in (b).

Image of Scheme 1.
Scheme 1.

Outline if the TNL process in aquecous solution.

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/content/aip/journal/apl/85/10/10.1063/1.1773620
2004-09-13
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Tribonanolithography of silicon in aqueous solution based on atomic force microscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/10/10.1063/1.1773620
10.1063/1.1773620
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