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Schematic diagram of the internal-type linear ICP source used in this experiment and the arrangement of the permanent magnets in the source.
The effect of the magnetic field on the rms voltage across the coil and the dc potential shift on the insulator as a function of the rf power. The rf power was varied from at an Ar pressure of .
The effect of the magnetic field on the Ar ion density and PR etch rate. The ion density was measured at below the antenna. The rf power was varied from at an Ar pressure of .
Ion saturation currents measured by a Langmuir probe (a) perpendicular to the antenna and (b) parallel to the antenna at below the antenna as a function of the position of the chamber in the presence of a multipole magnetic field. The rf power was varied from at an Ar pressure of .
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