1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field
Rent:
Rent this article for
USD
10.1063/1.1784877
/content/aip/journal/apl/85/10/10.1063/1.1784877
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/10/10.1063/1.1784877
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of the internal-type linear ICP source used in this experiment and the arrangement of the permanent magnets in the source.

Image of FIG. 2.
FIG. 2.

The effect of the magnetic field on the rms voltage across the coil and the dc potential shift on the insulator as a function of the rf power. The rf power was varied from at an Ar pressure of .

Image of FIG. 3.
FIG. 3.

The effect of the magnetic field on the Ar ion density and PR etch rate. The ion density was measured at below the antenna. The rf power was varied from at an Ar pressure of .

Image of FIG. 4.
FIG. 4.

Ion saturation currents measured by a Langmuir probe (a) perpendicular to the antenna and (b) parallel to the antenna at below the antenna as a function of the position of the chamber in the presence of a multipole magnetic field. The rf power was varied from at an Ar pressure of .

Loading

Article metrics loading...

/content/aip/journal/apl/85/10/10.1063/1.1784877
2004-09-13
2014-04-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduction of the electrostatic coupling in a large-area internal inductively coupled plasma source using a multicusp magnetic field
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/10/10.1063/1.1784877
10.1063/1.1784877
SEARCH_EXPAND_ITEM