1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Planar thin film Josephson junction pairs and arrays via nanolithography and ion damage
Rent:
Rent this article for
USD
10.1063/1.1803620
/content/aip/journal/apl/85/14/10.1063/1.1803620
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/14/10.1063/1.1803620
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

(a) Top view of a junction pair prior to ion damage. A patterned cross-shaped film covered with the implant mask. (b) Schematic drawing of the junction pair and measurement configuration.

Image of FIG. 2.
FIG. 2.

Scope pictures of the current voltage characteristics of junction 1 (curve ), junction 2 (curve ), and the junction pair (curve ) at without (a) and with (b) microwave radiation.

Image of FIG. 3.
FIG. 3.

(a) The current–voltage characteristics of a ten-junction array with and without microwave radiation at . The first-order giant Shapiro step in detail is shown in the inset. (b) The dynamic resistance vs voltage curve of this junction under the same radiation. (c) The single junction RSJ model (solid line) fits the ten-junction array characteristic (open circles).

Loading

Article metrics loading...

/content/aip/journal/apl/85/14/10.1063/1.1803620
2004-10-14
2014-04-18
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Planar thin film YBa2Cu3O7−δ Josephson junction pairs and arrays via nanolithography and ion damage
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/14/10.1063/1.1803620
10.1063/1.1803620
SEARCH_EXPAND_ITEM