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(a) Real-time data at recorded during exposure of the and surfaces at and to atomic nitrogen from a remote rf plasma source. (b) Spectroscopic ellipsometric spectra of the imaginary part, , of the pseudodielectric function of and recorded at room temperature at the end of the nitridation runs (nitridation time was fixed at for all experiments). The inset show the model used for fitting spectra and derive nitride and thickness values.
XPS spectra of the and photoelectron peak of and surfaces exposed to atomic nitrogen at and . The peak is reported only for since no significant difference with temperature is found.
(Color online) AFM images of and after nitridation at and . The rms values are also reported. Lines and arrows in the images are for highlighting step width.
Surface potential values for the and before and after nitridation at and .
FWHM of XRD symmetric (0002) and asymmetric [101(bar)5] rocking curves for thick films grown directly on , on a nitrided surface at and
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