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Study of the interaction of and surfaces with atomic nitrogen
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10.1063/1.1814438
/content/aip/journal/apl/85/18/10.1063/1.1814438
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/18/10.1063/1.1814438

Figures

Image of FIG. 1.
FIG. 1.

(a) Real-time data at recorded during exposure of the and surfaces at and to atomic nitrogen from a remote rf plasma source. (b) Spectroscopic ellipsometric spectra of the imaginary part, , of the pseudodielectric function of and recorded at room temperature at the end of the nitridation runs (nitridation time was fixed at for all experiments). The inset show the model used for fitting spectra and derive nitride and thickness values.

Image of FIG. 2.
FIG. 2.

XPS spectra of the and photoelectron peak of and surfaces exposed to atomic nitrogen at and . The peak is reported only for since no significant difference with temperature is found.

Image of FIG. 3.
FIG. 3.

(Color online) AFM images of and after nitridation at and . The rms values are also reported. Lines and arrows in the images are for highlighting step width.

Image of FIG. 4.
FIG. 4.

Surface potential values for the and before and after nitridation at and .

Tables

Generic image for table
Table I.

FWHM of XRD symmetric (0002) and asymmetric [101(bar)5] rocking curves for thick films grown directly on , on a nitrided surface at and

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/content/aip/journal/apl/85/18/10.1063/1.1814438
2004-11-03
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Study of the interaction of 4H–SiC and 6H–SiC(0001)Si surfaces with atomic nitrogen
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/18/10.1063/1.1814438
10.1063/1.1814438
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