Full text loading...
Fabrication process flow outline for the tunable microtoroid resonators. (a) Oxide is lithographically defined and etched leaving oxide disks followed by metallization via evaporation on both sides of the wafer in order to create the electrical contacts. Ohmic contacts are formed by annealing in a nitrogen ambient at in a tube furnace. (b) The wafer is isotropically etched using xenon difluoride. (c) The oxide disks are exposed to a laser in order to reflow the disks, creating the tunable UHQ microtoroids. (d) A scanning electron micrograph of a tunable microtoroid resonator.
(Color online) Resonant frequency shift versus voltage (see Ref. 2). The quadratic coefficient is .
(Color online) The frequency response of the tunable microtoroid resonators in both air and helium ambient atmospheres. Inset: A rendered depiction of the tunable microtoroid device coupled to a tapered optical fiber while being contacted by a metal probe.
Article metrics loading...