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SH micrographs of a fused silica thermally poled at 3.5 kV and 280 °C for 30 min. (a) Channel 1 image; (b) channel 2 image; (c) overlay image from (a) and (b).
Line-scan SH micrographs across the SON layer. (a) Channel 1 image; (b) channel 2 image.
Spatial distribution of the SON layer.
Evolution of the SON layer with poling time.
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