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Volume 85, Issue 25 Front cover image - large version

Volume 85, Issue 25, 20 December 2004

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Index of content:

FEATURED ARTICLE
  • Single-mask, three-dimensional microfabrication of high-aspect-ratio structures in bulk silicon using reactive ion etching lag and sacrificial oxidation
  • PLASMAS AND ELECTRICAL DISCHARGES
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38d913362403a4a254fa758cb6527ba5 journal.issuezxybnytfddd
Scitation: Applied Physics Letters - Volume 85, Issue 25
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/25
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