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Single-mask, three-dimensional microfabrication of high-aspect-ratio structures in bulk silicon using reactive ion etching lag and sacrificial oxidation
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10.1063/1.1834720
/content/aip/journal/apl/85/25/10.1063/1.1834720
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/25/10.1063/1.1834720
/content/aip/journal/apl/85/25/10.1063/1.1834720
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/content/aip/journal/apl/85/25/10.1063/1.1834720
2004-12-15
2014-09-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Single-mask, three-dimensional microfabrication of high-aspect-ratio structures in bulk silicon using reactive ion etching lag and sacrificial oxidation
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/25/10.1063/1.1834720
10.1063/1.1834720
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