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Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation
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10.1063/1.1835002
/content/aip/journal/apl/85/25/10.1063/1.1835002
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/25/10.1063/1.1835002
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Nitrogen uptake of the target surface (a) and nitrogen gas partial pressure (b) during sputter magnetron operation, at increasing (full squares) and decreasing (open triangles) nitrogen flow. The argon gas flow was 10.4 sccm. Location of the analysis is the center of the race track. The diamonds denote the respective nitrogen uptake after switching off the magnetron.

Image of FIG. 2.
FIG. 2.

Nitrogen-to-argon partial pressure ratio (right scale, open triangles) and nitrogen areal density at the target surface (left scale, full squares) at increasing reactive gas flow, as obtained after switching off the magnetron. Location of analysis is the center of the racetrack. The nitrogen areal density has also been calculated by TRIDYN computer simulation, with different partial pressure ratios, with the relation between reactive gas flow and partial pressure ratio as given by the experimental data, and for nitrogen ion implantation and full sticking of the nitrogen molecules corresponding to an atomic nitrogen flux with (dotted line), nitrogen ion implantation and an atomic nitrogen flux with (solid line), and nitrogen ion implantation only (dashed line). At high partial pressure ratio, the calculated areal density corresponds to 2.5 nm of stoichiometric TiN.

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/content/aip/journal/apl/85/25/10.1063/1.1835002
2004-12-15
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanisms of target poisoning during magnetron sputtering as investigated by real-time in situ analysis and collisional computer simulation
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/25/10.1063/1.1835002
10.1063/1.1835002
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