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Schematic of the experimental setup: A cathodic arc source produced a plasma streaming toward a set of 11 substrates, biased between 0 and in steps of 10 V. The substrates were arranged in a circle of 12 cm diameter. Schematic is not to scale, not all samples are shown.
Result of thickness measurements as a function of bias voltage; thickness is normalized to value at zero bias; the absolute thickness was 125 nm and 50 nm for Zr and Au films, respectively. The error bars indicate the error determined by repeating thickness measurements several times.
Data of Fig. 2 presented as self-sputtering yield vs bias. The error bars indicate the uncertainty of the determination, including errors of parameters , and .
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