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dot organization on substrates patterned by focused ion beam
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10.1063/1.1828597
/content/aip/journal/apl/85/26/10.1063/1.1828597
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/26/10.1063/1.1828597
/content/aip/journal/apl/85/26/10.1063/1.1828597
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/content/aip/journal/apl/85/26/10.1063/1.1828597
2004-12-17
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ge dot organization on Si substrates patterned by focused ion beam
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/26/10.1063/1.1828597
10.1063/1.1828597
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