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behavior for a fully silicided film on both and substrates.
XTEM images and selective area electron diffracton patterns for both reactions: (a) on substrate and (b) on substrate. The revealed thin void layer close to the top surface is due to Kirkendall voiding.
(a) XPS for film surface, middle region, and interface. (b) Random and aligned RBS for a fully silicided film on both and substrates. The inset shows the comparison between raw data and simulation data (solid line). For the inset the raw yield and simulation data for has been doubled to make a clear view.
Dark-field PTEM pictures for both reactions: (a) on and (b) on .
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