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Fabrication of strain tunable infrared frequency selective surfaceson electrostrictive poly(vinylidene fluoride–trifluoroethylene) copolymer films using a stencil mask method
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10.1063/1.1775036
/content/aip/journal/apl/85/4/10.1063/1.1775036
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/4/10.1063/1.1775036
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

The scheme of the procedure for the fabrication of the stencil mask and the deposition of metal through the stencil mask.

Image of FIG. 2.
FIG. 2.

(a) The SEM image of stencil mask. Inset is that of the pattern. (b) The SEM image of cross arrays fabricated by deposition through the stencil mask. Inset is the transmission spectrum of the obtained FSS.

Image of FIG. 3.
FIG. 3.

Transmission spectra of an isolated dipole-type FSS before (solid curve) and after (dotted curve) stretching. Inset is the SEM image of the dipole FSS device.

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/content/aip/journal/apl/85/4/10.1063/1.1775036
2004-07-23
2014-04-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Fabrication of strain tunable infrared frequency selective surfaceson electrostrictive poly(vinylidene fluoride–trifluoroethylene) copolymer films using a stencil mask method
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/4/10.1063/1.1775036
10.1063/1.1775036
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