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Reactor and plasma properties. (a) Reactor schematic in the plane showing showerhead and pump port locations. The pump port occupies only the quadrant on the right-hand side of the plane. (b) Ion density and electron temperature during pulsed operation (, , , duty cycle, average power ).
(Color) Plasma properties during cw operation and averaged over a pulse period for pulses 2,3,4, 5, and 6 following cw operation. (Average power , , , , duty cycle ). (Top) density above the wafer. The maximum ion density is noted in each figure. (Bottom) Power deposition below the dielectric window. The white circle is the outline of the electrode. The black wedge in the right quadrant denotes the pump port. The plasma properties gradually become more uniform during pulsed operation.
Asymmetry factor for density above the wafer and electron impact ionization sources below the dielectric for several pulses following cw operation. (Average power , , , duty cycle ). Asymmetry factors show nonmonotonic behavior during pulsed operation.
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