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Schematic diagram of various types of roughness, LER, SWR, and PFR, which evolve during RIE. In LER, variation in occurs along ; in SWR, variation in occurs within plane; and in PFR, variation in occurs within plane.
SEM micrograph of cross-section of waveguide.
Dependence of SWR on etch depth for (a) pure at 35 and , and (b) mixture of , at . All samples are etched at . The pure plots are repeated in (b) for comparison.
AFM figures of (a) pure and (b) mixture of treated samples. The arrow shows scanning directions.
Negative SIMS spectra for (a) pure and (b) mixture of treated samples.
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