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Variation of sidewall roughness of polymeric waveguides during reactive ion etching
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10.1063/1.1779355
/content/aip/journal/apl/85/7/10.1063/1.1779355
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/7/10.1063/1.1779355
/content/aip/journal/apl/85/7/10.1063/1.1779355
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/content/aip/journal/apl/85/7/10.1063/1.1779355
2004-08-10
2014-07-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Variation of sidewall roughness of polymeric waveguides during reactive ion etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/7/10.1063/1.1779355
10.1063/1.1779355
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