1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Variation of sidewall roughness of polymeric waveguides during reactive ion etching
Rent:
Rent this article for
USD
10.1063/1.1779355
/content/aip/journal/apl/85/7/10.1063/1.1779355
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/7/10.1063/1.1779355
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Schematic diagram of various types of roughness, LER, SWR, and PFR, which evolve during RIE. In LER, variation in occurs along ; in SWR, variation in occurs within plane; and in PFR, variation in occurs within plane.

Image of FIG. 2.
FIG. 2.

SEM micrograph of cross-section of waveguide.

Image of FIG. 3.
FIG. 3.

Dependence of SWR on etch depth for (a) pure at 35 and , and (b) mixture of , at . All samples are etched at . The pure plots are repeated in (b) for comparison.

Image of FIG. 4.
FIG. 4.

AFM figures of (a) pure and (b) mixture of treated samples. The arrow shows scanning directions.

Image of FIG. 5.
FIG. 5.

Negative SIMS spectra for (a) pure and (b) mixture of treated samples.

Loading

Article metrics loading...

/content/aip/journal/apl/85/7/10.1063/1.1779355
2004-08-10
2014-04-16
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Variation of sidewall roughness of polymeric waveguides during reactive ion etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/85/7/10.1063/1.1779355
10.1063/1.1779355
SEARCH_EXPAND_ITEM