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Stability of tris(8-hydroxyquinoline)-aluminum(III) films investigated by vacuum ultraviolet spectroscopic ellipsometry
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10.1063/1.1883314
/content/aip/journal/apl/86/11/10.1063/1.1883314
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/11/10.1063/1.1883314
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

The pseudo-dielectric constant of an OMBD deposited film measured in situ (continuous lines) and after atmosphere exposure (dotted lines). The real and imaginary parts of the dielectric constant for OVPD® deposited material are shown by dashed lines for comparison.

Image of FIG. 2.
FIG. 2.

In situ and ellipsometric spectra of the film (squares) and the corresponding fits using oscillator model (continuous lines). The ellipsometric spectra after atmosphere exposure are shown by circles and the fit that takes into account the surface morphological changes by dotted lines.

Image of FIG. 3.
FIG. 3.

and optical constants of in VUV range. The calculated excited state transitions with their oscillator strengths are shown by columns and the convoluted curve by a dashed line.

Image of FIG. 4.
FIG. 4.

Typical AFM images of atmosphere exposed films deposited by OMBD (left) and OVPD® (right).

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/content/aip/journal/apl/86/11/10.1063/1.1883314
2005-03-08
2014-04-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stability of tris(8-hydroxyquinoline)-aluminum(III) films investigated by vacuum ultraviolet spectroscopic ellipsometry
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/11/10.1063/1.1883314
10.1063/1.1883314
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