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The pseudo-dielectric constant of an OMBD deposited film measured in situ (continuous lines) and after atmosphere exposure (dotted lines). The real and imaginary parts of the dielectric constant for OVPD® deposited material are shown by dashed lines for comparison.
In situ and ellipsometric spectra of the film (squares) and the corresponding fits using oscillator model (continuous lines). The ellipsometric spectra after atmosphere exposure are shown by circles and the fit that takes into account the surface morphological changes by dotted lines.
and optical constants of in VUV range. The calculated excited state transitions with their oscillator strengths are shown by columns and the convoluted curve by a dashed line.
Typical AFM images of atmosphere exposed films deposited by OMBD (left) and OVPD® (right).
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