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(a) Scanning electron microscope picture of cleaved facet of wide, fully processed laser, grating adds another in total width. (b) Magnified top∕side view (oblique off vertical) of grating, taken directly after deep etching. The arrow indicates the edge of the waveguide. (c) Schematic of laser and contact pad.
Emission spectra on logarithmic scale at over a wide span of injection current densities. (a) Device with length: and width: . (b) Device with , and , current densities are chosen as indicated by circles in inset of Fig. 4. (c) FP laser on different sample but stemming from same wafer with and .
Emission frequency for devices with different rib width and length vs operating temperature. Wave numbers refer in all cases to single-mode spectra obtained not far above the threshold. Injection current was pulsed with repetition rate and pulse width. The inset shows sample spectra on normalized linear scale from which below data are extracted.
Threshold injection current vs operating temperature for same devices as in Fig. 3. Inset shows sample total light output vs current density curves for the smallest laser. Three shaded circles reference to current densities used in Fig. 2(b).
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