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Idealized model used to fit the reflectivity data. Films are considered to be made of Layer 1 either composed of surfactant/pores and silica (respectively, before rinsing and after rinsing) of thickness electron density , and a roughness and of Silica layer 2 of thickness with an electron density , and a roughness . The in-plane spacing between pores or micelles is denoted as b. For clarity, the figure shows only 3 layers out of the layers really present in the films. The roughness of the layers is not shown in the picture. Films are supported by a glass substrate and silica cap and buffer layers are also introduced in the model.
GISAXS results of the rinsed film showing the 2D hexagonal structure.
Raman scattering experiments showing the disappearance of the stretching bands located around that confirm the removal of the surfactant upon rinsing. The Raman signals are normalized to the nitrogen peak located at .
Absolute reflectivity curves of the initial (a) and rinsed films (b). The top inset gives the electron density profile obtained from a fit via the matrix technique to the experimental data. The bottom inset shows a magnified view of the region below the critical angle. The value reported along the line is the average critical wave vector of the film. The modifications induced by the rinsing procedure are obvious both on the electron density profiles and on the average critical wave vector.
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