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Self-planarizing process for the fabrication of stacks
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10.1063/1.1875764
/content/aip/journal/apl/86/12/10.1063/1.1875764
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/12/10.1063/1.1875764
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Main steps in the fabrication of a self-planarized stack.

Image of FIG. 2.
FIG. 2.

(a) Schematic view of a stack (side view) and (b) Photograph of a stack (top view).

Image of FIG. 3.
FIG. 3.

Typical XRD profiles of (a) as-grown single crystal and (b) the crystal modified by soaking in a 0.1% solution.

Image of FIG. 4.
FIG. 4.

Surface morphology observed by AFM for a self-planarized stack. The sample was soaked in a 0.1% solution for .

Image of FIG. 5.
FIG. 5.

Typical characteristic of a self-planarized stack for low bias-voltage region measured at .

Image of FIG. 6.
FIG. 6.

Number of the junctions in the stacks for the concentration of solution.

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/content/aip/journal/apl/86/12/10.1063/1.1875764
2005-03-15
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Self-planarizing process for the fabrication of Bi2Sr2CaCu2Ox stacks
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/12/10.1063/1.1875764
10.1063/1.1875764
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