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Electrodeposition of bismuth thin films on (110)
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10.1063/1.1886248
/content/aip/journal/apl/86/12/10.1063/1.1886248
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/12/10.1063/1.1886248
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Current–voltage curves for (110) in solution containing and at a scan rate of : (a) stationary conditions and (b) rotating disk electrode at a rotation rate of . The inset shows the diffusion limited deposition current at versus the square root of the rotation rate.

Image of FIG. 2.
FIG. 2.

Atomic force microscope images of (a) , (b) , and (c) electrodeposited bismuth films on (110).

Image of FIG. 3.
FIG. 3.

vs x-ray diffraction patterns for (a) and (b) thick bismuth films deposited on GaAs (110).

Image of FIG. 4.
FIG. 4.

Current–voltage curves for a junction with a bismuth film. The series resistance was about . The inset shows the time dependence of the barrier height after deposition.

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/content/aip/journal/apl/86/12/10.1063/1.1886248
2005-03-17
2014-04-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrodeposition of bismuth thin films on n-GaAs (110)
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/12/10.1063/1.1886248
10.1063/1.1886248
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