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XRD scans and pole figures of thin films grown on exactly cut [(a) and (b)],  miscut [(c) and (d)], and  miscut [(e) and (f)] YSZ(100) substrates using the 200 reflection . The arrows in (d) and (f) indicate that the lattice plane is parallel to the YSZ(100) lattice plane, which is tilted with respect to the top and bottom surfaces of the substrate.
(a) Schematic drawing of the rectangle-on-cube epitaxy of on YSZ(100) (see Refs. 4–6). [(b) to (e)] XRD scans of BLT films grown on layers on  miscut [(b) and (c)] and  miscut [(d) and (e)] YSZ(100) substrates using the BLT 111 reflection . The scans are recorded at [(b) and (d)] and [(c) and (e)], respectively, in correspondence to the (100)- and (118)-oriented parts of the BLT films.
Plan-view TEM image of a BLT film grown on (110) on a  miscut YSZ(100) substrate. Two predominant grain orientations separated by are seen. The inset is an electron diffraction pattern consisting of two rows of BLT reflections.
Remanent polarization as a function of the applied electric field of capacitors using three different YSZ(100) single-crystal substrates. The inset represents corresponding polarization-electric field hysteresis loops.
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