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Effective removal of hydrogen resists used to pattern devices in silicon using scanning tunneling microscopy
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10.1063/1.1897064
/content/aip/journal/apl/86/14/10.1063/1.1897064
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1897064
/content/aip/journal/apl/86/14/10.1063/1.1897064
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/content/aip/journal/apl/86/14/10.1063/1.1897064
2005-04-01
2014-11-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effective removal of hydrogen resists used to pattern devices in silicon using scanning tunneling microscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1897064
10.1063/1.1897064
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