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Role of interface traps on breakdown process of a magnetic tunnel junction
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10.1063/1.1897846
/content/aip/journal/apl/86/14/10.1063/1.1897846
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1897846
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

The variation of TMR and specific as a function of oxidation time. The line is a guide for the eyes.

Image of FIG. 2.
FIG. 2.

Weibull plots of time to breakdown under an electronic bias voltage for the junctions with various oxidation times : (a) When the top electrode is positively biased and (b) when the top electrode is negatively biased.

Image of FIG. 3.
FIG. 3.

Current variations, normalized by initial current , as a function of stress time under a constant voltage stress for the junctions with : (a) When the top electrode is positively biased and (b) when the top electrode is negatively biased.

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/content/aip/journal/apl/86/14/10.1063/1.1897846
2005-03-30
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Role of interface traps on breakdown process of a magnetic tunnel junction
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1897846
10.1063/1.1897846
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