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Preparing films less than thick by low-temperature metalorganic chemical vapor deposition
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10.1063/1.1899770
/content/aip/journal/apl/86/14/10.1063/1.1899770
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1899770
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

XRD patterns of -thick PZT films deposited on substrates at (a) 540 and (b) .

Image of FIG. 2.
FIG. 2.

hysteresis loops measured at for the films shown in Fig. 1: (a) and (b) .

Image of FIG. 3.
FIG. 3.

XRD patterns of -thick PZT films [(a)–(c)] without and [(d)–(f)] with -thick seeds: [(a) and (d)] As-deposited at and postannealed at [(b) and (e)] or [(c) and (f)] .

Image of FIG. 4.
FIG. 4.

hysteresis loops measured at for the films [(a)–(c)] without and [(d)–(f)] with seeds shown in Fig. 3: [(a) and (d)] As-deposited at and postannealed at [(b) and (e)] or [(c) and (f)] .

Image of FIG. 5.
FIG. 5.

Saturation properties of the [(a) and (c)] and [(b) and (d)] values against the maximum electric field for the films whose XRD patterns are shown in Fig. 3: [(a) and (b)] Prepared without seeds, [(c) and (d)] prepared with seeds, (엯) as deposited, (▴) annealed at , and (∎) annealed at .

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/content/aip/journal/apl/86/14/10.1063/1.1899770
2005-04-01
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Preparing Pb(Zr,Ti)O3 films less than 100nm thick by low-temperature metalorganic chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1899770
10.1063/1.1899770
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