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Preparing films less than thick by low-temperature metalorganic chemical vapor deposition
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10.1063/1.1899770
/content/aip/journal/apl/86/14/10.1063/1.1899770
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1899770
/content/aip/journal/apl/86/14/10.1063/1.1899770
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/content/aip/journal/apl/86/14/10.1063/1.1899770
2005-04-01
2014-07-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Preparing Pb(Zr,Ti)O3 films less than 100nm thick by low-temperature metalorganic chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/14/10.1063/1.1899770
10.1063/1.1899770
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