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X-ray diffraction pattern of the film deposited by the PLD technique. The asterisk indicates the diffraction peak of impurity phase.
PL spectra with a 3 W, 808 nm excitation source: (a) bulk material, (b) film. Experimental setup is schematically shown in the inset: (1) laser diode; (2) film sample; (3) focusing lens; (4) optical spectrum analyzer.
PL intensity at 1065.0 and 1342.5 nm emissions as a function of the input power.
Guided-mode spectra by measuring the reflected intensity versus the external angle of incidence. (a) TE mode, (b) TM mode.
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