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Electrical properties of plasma display panel with protecting thin films deposited by a radio frequency magnetron sputtering method
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10.1063/1.1899238
/content/aip/journal/apl/86/15/10.1063/1.1899238
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/15/10.1063/1.1899238

Figures

Image of FIG. 1.
FIG. 1.

Structure of the test panels.

Image of FIG. 2.
FIG. 2.

The XRD patterns of the thin films ( and ) grown at different substrate temperatures.

Image of FIG. 3.
FIG. 3.

The XRD patterns of the thin films grown as a function of the ZnO concentration levels.

Image of FIG. 4.
FIG. 4.

SEM images of the thin films. (a) , (b) . In both cases, .

Image of FIG. 5.
FIG. 5.

(a) Discharge voltages (firing voltages , sustain voltages ) and the memory coefficient of the thin films. In all cases, . (b) The discharge intensity as a function of applied voltages under of Ne gas.

Tables

Generic image for table
Table I.

Deposition conditions of thin films.

Generic image for table
Table II.

Driving conditions for measuring the discharge characteristics.

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/content/aip/journal/apl/86/15/10.1063/1.1899238
2005-04-06
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Electrical properties of plasma display panel with Mg1−xZnxO protecting thin films deposited by a radio frequency magnetron sputtering method
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/15/10.1063/1.1899238
10.1063/1.1899238
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