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Structure of the test panels.
The XRD patterns of the thin films ( and ) grown at different substrate temperatures.
The XRD patterns of the thin films grown as a function of the ZnO concentration levels.
SEM images of the thin films. (a) , (b) . In both cases, .
(a) Discharge voltages (firing voltages , sustain voltages ) and the memory coefficient of the thin films. In all cases, . (b) The discharge intensity as a function of applied voltages under of Ne gas.
Deposition conditions of thin films.
Driving conditions for measuring the discharge characteristics.
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