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Wave-vector diagram for QPM in (a) forward SHG, and (b) backward SHG.
Deep-UV laser lithography setup. MO: microscope objective; PH: pin-hole, CL: collimating lens; PM: phase mask; M: mirror.
AFM images showing the etched domain structure (a) on the patterned surface, and (b) on the backside. The scale bar is in both images.
Experimental setup of BSHG. : half-wave plate; BS: beamsplitter; PM: photomultiplier; F: 2 BG 39 filters.
BSHG intensity as a function of the fundamental wavelength for (a) seventh-order, and (b) sixth-order interactions.
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