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Evaluation of nickel and molybdenum silicides for dual gate complementary metal-oxide semiconductor application
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10.1063/1.1849850
/content/aip/journal/apl/86/2/10.1063/1.1849850
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/2/10.1063/1.1849850
/content/aip/journal/apl/86/2/10.1063/1.1849850
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/content/aip/journal/apl/86/2/10.1063/1.1849850
2005-01-04
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Evaluation of nickel and molybdenum silicides for dual gate complementary metal-oxide semiconductor application
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/2/10.1063/1.1849850
10.1063/1.1849850
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