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Magnetic suppression of secondary electrons in plasma immersion ion implantation
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10.1063/1.1852704
/content/aip/journal/apl/86/2/10.1063/1.1852704
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/2/10.1063/1.1852704
View: Figures

Figures

Image of FIG. 1.
FIG. 1.

Arc current, high voltage bias, transverse Faraday cup current, longitudinal cup current, and implantation current for a discharge without magnetic field.

Image of FIG. 2.
FIG. 2.

High voltage bias, transverse Faraday cup current, longitudinal cup current, and implantation current for a discharge with magnetic field. The inset shows actual implantation current, which seems smaller in the expanded view due to insufficient number of samples per scope sweep in that mode.

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/content/aip/journal/apl/86/2/10.1063/1.1852704
2005-01-06
2014-04-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Magnetic suppression of secondary electrons in plasma immersion ion implantation
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/2/10.1063/1.1852704
10.1063/1.1852704
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