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Control of the reactivity at a metal∕silica interface
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10.1063/1.1931821
/content/aip/journal/apl/86/20/10.1063/1.1931821
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/20/10.1063/1.1931821

Figures

Image of FIG. 1.
FIG. 1.

Elastic recoil detection analysis spectra obtained on the silica sample prepared by PECVD (solid line), WTO (dashed line), and DTO (dotted line). (Inset) A zoom of the region between 300 and , for the silica layers obtained by the thermal routes.

Image of FIG. 2.
FIG. 2.

Si references spectra of (solid line), (dashed line), and (dotted line).

Image of FIG. 3.
FIG. 3.

Si DOS obtained at the interfaces, for different preparations of the silica layer: PECVD (solid line), WTO (dashed line), and DTO (dotted line). The vertical bars show the maxima of the spectra of the reference compounds.

Tables

Generic image for table
Table I.

Hydrogen concentration as a function of the preparation of the silica layer, contributions of the reference spectra in the fit of the Si DOS obtained at the interfaces, and thickness of the interfacial zones.

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/content/aip/journal/apl/86/20/10.1063/1.1931821
2005-05-13
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Control of the reactivity at a metal∕silica interface
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/20/10.1063/1.1931821
10.1063/1.1931821
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