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BPM simulation of a 5-stage, 13-beamlet scanner showing full deflection at . The polarization direction of the crystal is perpendicular to the page, with the area enclosed by the triangles opposite in spontaneous polarization to the rest of the device. The peak deflection is 10.13° in one direction. The inset is the photolithographic mask fabricated for this device that shows two adjacent scanner channels.
(a) Far-field images taken of the complex beam pattern introduced by the microlens array as imaged at the focal point of a lens. (b) Shows the far-field beam image with the addition of the device. Both images (a) and (b) are attenuated equally and are . Shown in (c) is beamlet steering for various applied voltages. The horizontal panel size is in (c). The last panel in (c) is taken with camera saturation so that all 13 beamlets can be seen.
(a) Deflection angle vs applied voltage across only Stage 1 of the beamlet device. (b) Deflection angle vs the number of steering stages activated in the beamlet device.
Specification of beamlet scanner.
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