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Nucleation of nanostructures at pinned step bunches on the Si(111) surface
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10.1063/1.1940128
/content/aip/journal/apl/86/22/10.1063/1.1940128
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/22/10.1063/1.1940128
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Figures

Image of FIG. 1.
FIG. 1.

(a) UHV STM image of a Si (111) surface after deposition of 1 ML of Fe at RT followed by annealing at 500 °C for 15 min and then 650 °C for 20 min. Nanostructures are observed at step pinning sites. (b) Close-up of (a) showing alignment of a nanostructure along one of the Si directions.

Image of FIG. 2.
FIG. 2.

UHV STM image of the sample shown in Fig. 1 after annealing at 500 °C for 15 min and before annealing at 650 °C. Observed are thin metastable layers that have a reconstruction. The layers are separated by amorphous regions.

Image of FIG. 3.
FIG. 3.

AFM image of a Si (111) surface after deposition of 6 ML of Fe at RT followed by annealing at 500 °C for 12 h and then 850 °C for 1 h.

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/content/aip/journal/apl/86/22/10.1063/1.1940128
2005-05-24
2014-04-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Nucleation of β‐FeSi2 nanostructures at pinned step bunches on the Si(111) surface
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/22/10.1063/1.1940128
10.1063/1.1940128
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