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High-mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition
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10.1063/1.1942641
/content/aip/journal/apl/86/22/10.1063/1.1942641
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/22/10.1063/1.1942641
/content/aip/journal/apl/86/22/10.1063/1.1942641
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/content/aip/journal/apl/86/22/10.1063/1.1942641
2005-05-24
2014-10-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High-mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/86/22/10.1063/1.1942641
10.1063/1.1942641
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