No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Ultrathick, low-stress nanostructured diamond films
8.S. Bhattacharyya, O. Auciello, J. Birrell, J. A. Carlisle, L. A. Curtiss, A. N. Goyette, D. M. Gruen, A. R. Krauss, J. Schlueter, A. Sumant, and P. Zapol, Appl. Phys. Lett. 79, 1441 (2001).
13.W. C. Oliver and G. M. Pharr, J. Mater. Res. 7, 1564 (1992).
14.J. J. Jia, T. A. Callcott, J. Yurkas, A. W. Ellis, F. J. Himpsel, M. G. Samant, J. Stohr, D. L. Ederer, J. A. Carlisle, E. A. Hudson, L. J. Terminello, D. K. Shuh, and R. C. C. Perera, Rev. Sci. Instrum. 66, 1394 (1995).
15.G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).
16.Scanning white light interferometry analysis has also shown that, after delamination, the rms roughness of the back surface of the NCD film (i.e., the surface forming the NCD/Si substrate interface before film delamination) is for a scan, which is comparable to the roughness of the Si substrate before film deposition.
17.Error bounds for hardness and Young’s modulus are standard deviations over five consecutive nanoindentation tests.
18.Reference optical-grade (polished) free-standing microcrystalline diamond film was thick with an average grain size of , obtained from the Fraunhofer Institute, Freiburg, Germany.
19.See, for example, J. Stöhr, NEXAFS Spectroscopy (Springer, Berlin, 1996).
20.See, for example, L. Fayette, B. Marcus, M. Mermoux, G. Tourillon, K. Laffon, P. Parent, and F. Le Normand, Phys. Rev. B 57, 14123 (1998), and references therein.
Article metrics loading...
Full text loading...
Most read this month